Fine tuning hole injection for high-performance polyfluorene-based blue emitting device by adjusting work function of anode via deposition of CFx layer with proper ionization potential on indium tin oxide

Chung-Chin Hsiao,Chih-Hao Chang,Hsin-Hung Lu,Show-An Chen
DOI: https://doi.org/10.1016/j.orgel.2006.12.008
IF: 3.868
2007-01-01
Organic Electronics
Abstract:By introducing CFx thin film as hole injection layer on top of indium tin oxide (ITO) anode via plasma polymerization of CHF3, the device with poly(9,9-dioctylfluorene) (PFO) as emitting layer, ITO/CFx(35W)/PFO/CsF/Ca/Al, is prepared. At the optimal C/F atom ratio using the radio frequency power 35W, the device performance is optimal having the maximum current efficiency 3.1cd/A and maximum brightness 8400cd/m2. This is attributed to a better balance between hole and electron fluxes, resulting from a decrease in hole injection barrier as manifested by ultraviolet photoelectron spectroscopy and scanning surface potential microscopy.
What problem does this paper attempt to address?