An in Situ Copper Plated Boron‐Doped Diamond Microelectrode Array for the Sensitive Electrochemical Detection of Nitrate

S Ward-Jones,CE Banks,AO Simm,L Jiang,RG Compton
DOI: https://doi.org/10.1002/elan.200503316
IF: 3.077
2005-01-01
Electroanalysis
Abstract:The first example of using a copper microelectrode array for use in electroanalysis is explored and exemplified with the electroanalytical quantification of nitrate. The analytical approach is based upon the in situ deposition of copper at a boron-doped diamond (BDD) microelectrode array. The immobilized copper layer is electrocatalytic for nitrate reduction and exhibits an analytically useful range from 1.2 to 124 μM with a marked selectivity for nitrate ion over nitrate, with a limit of detection of 0.76 μM. The analytical applicability was examined through standard addition determinations of nitrate in drinking and river water samples.
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