Abstract:Silicon-based organic precursors are widely applied in the vapor-fed flame synthesis of monocrystalline silicon, silicon dioxide, and silicon nitride. Due to the lack of kinetic investigations on reactions of silicon-based organic precursors, rate constants were usually analogized to those of their hydrocarbon counterparts. Investigations on the similarities and differences between the two types of compounds become necessary. This work reports a comparative theoretical investigation on H-abstraction reactions with H and CH3 attacking for silanes and their alkane counterparts, including silane and methane, disilane, methylsilane and ethane, dimethylsilane and propane, trimethylsilane and iso-butane, and tetramethylsilane and neo-pentane at the domain-based local pair natural orbital coupled cluster with perturbative triple excitations (DLPNO-CCSD(T))/cc-pVTZ//M06–2X/cc-pVTZ level. The rate constants were calculated using the conventional transition-state theory coupled with the asymmetric Eckart tunneling corrections over 600–2000 K. The calculated results show that dramatic discrepancies exist between H-abstraction from silicon sites in silanes and equivalent carbon sites in their alkane counterparts with H and CH3 attacking. The H-abstraction reactions from the primary carbon sites in silanes have generally lower barrier energies than the similar reactions in their alkane counterparts, while those in methylsilane and dimethylsilane with H attacking are the only two with higher barrier energies. Electrostatic potential mapped molecular van der Waals surfaces were adopted to provide insight into the calculated trends in barrier energies. The H-abstraction reactions from silicon sites in silanes have much higher rate constants than those from equivalent carbon sites in their alkane counterparts, especially under low-temperature conditions, while the rate constants of H-abstraction reactions from primary carbon sites in silanes and their alkane counterparts show relatively strong analogy.This article has not yet been cited by other publications.

Dual-Level Direct Dynamics Studies on the Reactions of Tetramethylsilane with Chlorine and Bromine Atoms

Gas-phase kinetics of chlorosilylene reactions. I. ClSiH + Me3SiH: absolute rate measurements and theoretical calculations for prototype Si-H insertion reactions

Theoretical Investigations for Kinetics of the Chemical Reactions: H + SiClx (x = 1, 2, 3).

Deciphering Dynamics of the Cl + SiH 4 → H + SiH 3 Cl Reaction on a Machine Learning Made Globally Accurate Full-Dimensional Potential Energy Surface.

"Stripping" the carbon atom of methyl halide by a cationic holmium complex: a gas-phase study.

Gas-phase kinetics of chlorosilylene reactions II. ClSiH + C2H4: absolute rate measurements and quantum chemical and RRKM calculations for the prototype pi addition reaction

Detailed quasiclassical dynamics of the F– + SiH3Cl multi-channel reaction

Low Energy Electron Attachment by Some Chlorosilanes

Theoretical Investigation on H-Abstraction Reactions of Silanes with H and CH 3 Attacking: A Comparative Study with Alkane Counterparts

Thermal electron attachment to halogenated silanes in the gas phase

Ion Molecule Reactions in the HBr+ + CH4 System: A combined experimental and theoretical study

ON MECHANISMS OF OXYGEN INFLUENCE ON GAS-PHASE PARAMETERS AND SILICON REACTIVE-ION ETCHING KINETICS IN HBr + Cl2 + O2 PLASMA

Gas Phase Reactions Between Sih4 and B2h6: A Theoretical Study

Detailed Kinetics of Methylphenyldichlorosilane Synthesis from Methyldichlorosilane and Chlorobenzene by Gas Phase Condensation

Elementary Kinetics for Gas Phase Combustion of SiCl4 Based Mixtures

Ab Initio Characterization of the Potential Energy Profiles for the Multi-Channel Reactions: H/Cl + Ch3oh

Ab initio and DFT benchmark study for nucleophilic substitution at carbon (SN2@C) and silicon (SN2@Si)

Time-resolved gas-phase kinetic and quantum chemical studies of the reaction of silylene with oxygen

Exploration of photocatalytic chlorination combined simplified distillation to produce electronic grade high-purity trichlorosilane via microchannel reactor experiments, multiphase-flow simulation, ReaxFF MD, and DFT

Thermodynamic Research on Synthesis of Dichloromethylphenylsilane by Condensation Method