Target ablation characteristics of thin films during nanosecond pulsed laser deposition in the ablation process

tan xinyu,zhang duanming,li zhihua,guan li,li li
DOI: https://doi.org/10.7498/aps.54.3915
IF: 0.906
2005-01-01
Acta Physica Sinica
Abstract:The whole ablation process of target during the pulsed laser preparation of thin films is studied in this paper. An ablation model of targets in which the vaporization is taken account is present based on the superheated theory. Different heat flux equations for different stages are then established. Finally, as using Si as the target, a finite difference method is employed to simulate the space- and time-dependence of temperature in the target. Vaporization velocity and vaporization thickness evolutions with different laser fluence are investigated. The dependence of solid-liquid interface location S(t) on time which takes into account the melting relaxation time is derived too. The results show that the vaporization strongly affects the surface temperature in the pulsed laser ablation. When the laser intensity reaches near the phase explosion energy threshold, the vaporization velocity and ablation depth will evidently decrease because of the gas dynamic effects. This result is more appropriate than that obtained in previous works.
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