Active Ti/SnO2 Anodes for Pollutants Oxidation Prepared Using Chemical Vapor Deposition

Peidong Yao,Xueming Chen,Hao Wu,Dahui Wang
DOI: https://doi.org/10.1016/j.surfcoat.2008.01.026
IF: 4.865
2008-01-01
Surface and Coatings Technology
Abstract:The tin oxide films were successfully deposited on Ti substrates by chemical vapor deposition (CVD) using a gas phase mixture of SnCl4 and H2O as a precursor at 550 degrees C. The physicochemical and electrochemical properties as well as the electrocatalytic activity of the Ti/SnO2 electrodes prepared were investigated. It was found that the new electrodes had compact microstructure, high overpotential for oxygen evolution, and superior activity for pollutants oxidation. Over 95% chemical oxygen demand (COD) removal was achieved for oxidation of both phenol and oxalic acid, with current efficiencies (CE) of 59% for phenol and 62% for oxalic acid obtained. (C) 2008 Elsevier B.V. All rights reserved.
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