Synthesis of Nano-sized CeO2 in Alcohol/Water Mixed Solvents under Ultrasonic Radiation and its Polishing Performance

Yang Chen,Zhigang Chen,Xiazhang Li,Ailian Chen
DOI: https://doi.org/10.3969/j.issn.0254-0150.2007.03.042
2007-01-01
Abstract:Nano-powder of CeO2 was prepared in butanol /water mixed solvents under ultrasonic radiation,and was collocated into polishing slurry for chemical-mechanical polishing of silicon wafer.The polishing behavior of nano-sized CeO2 was studied by Atomic Force Microscope (AFM).The effects of alcohol/water mixed solvents and ultrasonic radiation on the size and agglomerate of the formed powder were discussed.The results show that the particles prepared in alcohol/water mixed solvents in appropriate ultrasonic radiation are of smaller size and better dispersion than those obtained from the ordinary powders synthesized in water solution.A super smooth surface with roughness of 0.108 nm was obtained within 2 μm×2 μm area polished by nano-sized CeO2,and its surface undulation is very small.
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