Ab Initio Molecular Dynamics Study of Sulfur Adsorption on Si(100)2x1

YJ Zhao,M Jiang,GM Lai,PL Cao
DOI: https://doi.org/10.1016/s0375-9601(99)00114-0
IF: 2.707
1999-01-01
Physics Letters A
Abstract:The adsorption of sulfur on the Si(100)2x1 surface at the coverage of 0.25, 0.50, and 1.0ML is studied by the ab initio molecular dynamics method. It is found that the S adsorbed Si(100) surface structure is sensitive to the coverage of S atoms. At 0.25ML, the cave site is suggested to be the preferable site for the S atom. At 0.50ML, it is found that S atoms prefer to near the top sites, with a very strong bond with nearby silicon dimer atoms. Under the coverage of 1ML, it is confirmed that sulfur is a good adsorbate to restore Si(100) surface as selenium.
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