Abstract:Scanning electron microscope (SEM) and its variations, such as critical dimension SEM (CD-SEM) and electron beam inspection (EBI-SEM), are getting increasingly critical in process control in very large-scale integration circuits (VLSI) manufacturing. For rapid capturing of image, the patterned wafer surface needs to be maintained in a range smaller than the depth of focus (DoF) of the electron beam. A triangulation optical system is used to sense the wafer surface for the rapid leveling of the wafer height in real time. An optical grating illuminated by a LED light source is projected onto the wafer and further imaged to a camera. The wafer height is calculated from the displacement of the optical grating image. However, pattern variation under the measurement area of the wafer may affect the transmission ratio of the light to the sensor and further the measurement accuracy. To achieve a high precision measurement result, an automatic light intensity adjustment system is developed. A computer records the optical grating image and the image intensity is analyzed. If the grating image intensity in the bright area is not in the desired range, a control software will convert the delta into the LED driving current increment or decrement, and the LED light output will be adjusted accordingly so that the image intensity is brought back to the expected range and keep there for the entire process. The LED feedback control experiment shows that the system remains at the target grey level without noticeable variation when the system transmission ratio varies by a factor of 7.5 times.

Adjustable Illuminance Diffusion Calibration Light Source Produced with Integrating Sphere

Spectrum measurement for LED-based spectrum-tunable source

Calibrating Light Sources by Using a Planar Mirror.

Automatic Measurement for Light Distribution Curve of Ultra High Pressure Mercury Lamps

Research on illumination measurement system by segmented calibration based on MCU

Self-adaptive LED Spectrum-Tunable Light Source with High Output Irradiance and Uniformity

Uniform illumination design by configuration of LEDs and optimization of LED lens for large-scale color-mixing applications.

Optical design for uniform color mixing illumination system

Lighting Deviation Correction for Integrating-Sphere Multispectral Imaging Systems.

Study on a system for LED's photometric and colorimetric measurement based on a multi-channel spectrometer

Improved spectral radiance responsivity calibration of charge-coupled- device (CCD) imaging spectrometer with an internally illuminated integrating sphere

Design of Ellipsoid and Spherical Combined Light Source for Uniform Flux and Color Mixing

Compact Ultraviolet Light-Emitting Diode-Based Lithography Illumination System with Tunable Coherent Factor

Automatic control of LED light source for wafer height leveling in electron beam imaging systems

Simulation of the output irradiance of integrating sphere with Monte Carlo method

Study on a Spectrophotometer System for Measuring LED's Photometric Parameters

Study on Methodology of LED's Luminous Flux Measurement with Integrating Sphere

A type of spectrophotometer with both SCI and SCE measurement structures

THE DESIGN OF THE SHIFTING SECTION OF AN INTENSIFIER SILICON TARGET PICK-UP TUBE

Design Of Led Dimming System With The Specific Target Parameter Control Function

The New Process of Measuring Method for Luminance Contrast under Bright Room Condition