Abstract:Hafnium oxide (HfO 2 ) thin films doped with lanthanum (La) can achieve ferroelectricity, making the material applicable in transistor and memory technologies. To downscale future devices in the semiconductor industry, the application of the doped HfO 2 material requires deposition on complex microscopic three-dimensional (3D) structures. A widely used process for the preparation of doped HfO 2 thin films is atomic layer deposition (ALD). With 3D geometries, it is challenging to deposit materials homogeneously and to effectively characterize them. To forego the difficulties in film characterization, two-dimensional (2D) PillarHall lateral high aspect ratio (LHAR) test structures are used. These structures expose a lateral surface to facilitate the conformality analysis of thin films deposited using two different ALD processes. In this work, we aim to further advance the arsenal of analysis techniques used to characterize La doped HfO 2 thin films by using x-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) to analyze uniformity and composition. The XPS technique can be applied and established as a method for the optimal analysis of thin films deposited on LHAR structures. Both techniques provide a complementary analysis of material formation, elemental distribution, measurement along the LHAR depth range, and can probe differences between deposition processes.

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Effect of Oxidation Time on the Structure and Properties of Ti-25Nb-3Zr-2Sn-3Mo Titanium Alloy Microarc Oxide Film Layer

Formative and frictional behavior of amine self-assembled monolayers

Preparation and Tribological Behaviors of an Amide-Containing Stratified Self-Assembled Monolayers on Silicon Surface

Preparation and study of complex self-assembled film as a super-thin barrier on silver

Structural Investigation of Langmuir-Blodgett Films on Self-Assembly Modified Au Substrates

In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique

Growth of Self-Assembled Monolayer on Tetrahedral Amorphous Carbon Film Coated Magnetic Head

Lanthanum doped hafnium oxide thin films deposited on a lateral high aspect ratio structure using atomic layer deposition: A comparative study of surface composition and uniformity using x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

Research on the Preparation, Characterization and Tribological Properties of Ultra-Thin Self-Assembled Monolayers on the Magnetic Head Surface

Effect of Trimethyl Aluminium Surface Pretreatment on Atomic Layer Deposition Al2o3 Ultra-Thin Film on Si Substrate

Self-assembled Monolayers of 3-MPT and Its Mixed-Monolayers with Alkanethiol on Silver: Studies by XPS and Electrochemical Methods

XPS and AFM Characterization of the Self‐assembled Molecular Monolayers of a 3‐aminopropyltrimethoxysilane on Silicon Surface, and Effects of Substrate Pretreatment by UV‐irradiation

Lanthanum Concentration Dependence of Electrical Properties in Tin Oxide Thin Films

Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films

Atomic Layer Deposition of Lanthanum-Based Ternary Oxides

Formation of Amino‐terminated Self‐assembled Monolayers from Long‐chain Aminomethoxylsilanes

Molecular Arrangement Mechanisms Within Phosphate Films on Ti6Al4V Regulated by Intermolecular Forces Based on Sum Frequency Generation Vibrational Spectroscopy

Effects of amino-terminated self-assembled monolayers on nucleation and growth of chemical vapor-deposited copper films

Time Effect in Chemical Oxidation of La<sub>2</sub>CuO<sub>4</sub>Epitaxial Thin Films

Substrate and Thickness Effects on Structure and Transport Properties of La2/3ca1/3mno3 Films