Digital shifting photoelasticity with optical enlarged unwrapping technology for local stress measurement

Xue-Feng Yao,Long-Hui Jian,Wei Xu,Guan-Chang Jin,Hsien-Yang Yeh
DOI: https://doi.org/10.1016/j.optlastec.2004.08.003
IF: 4.939
2005-01-01
Optics & Laser Technology
Abstract:In this paper, photoelasticity combined with phase shifting technology is used to obtain stress distribution within the stress concentration zone. Both the optical enlarged unwrapping technology and the combined path shear difference technology are provided for evaluating the local stress information. By means of a phase shifting photoelastic experiment of a diametric-compressed disc, the stress components surrounding the local loading zone are determined. The results show not only a good improvement compared with conventional photoelastic analysis but also a good agreement with theoretical data.
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