Influence of Defects on the Resistive Switching Mechanism of RRAM

YANG Jin,DAI Yue-hua,XU Tai-long,JIANG Xian-wei,XU Hui-fang,LI Jin-long,LUO Jing,CHEN Jun-ning
DOI: https://doi.org/10.3969/j.issn.1001-9731.2013.17.010
2013-01-01
Journal of Functional Biomaterials
Abstract:The resistance switching effect physical mechanisms of resistance random accessory memory was stud-ied with the first-principles based on the density functional theory and the VASP software.The comparison cal-culation of the energy band,density of states,isosurface of partial charge density and formation energies of Ag doped system,oxygen vacancy defect system and the co-doped composited defect system of the Ag and oxygen vacancy in the monoclinic HfO2 are performed.The calculated results reveal that the conductive path of Ag doped system can be established,but the oxygen vacancy defect system cannot be established under the same concentration.The calculated results also reveal that the conductivity of the resistance switching mechanisms in co-doped system was mainly dependent on the Ag and was auxiliary dependent on the oxygen vacancy defects, the formation energy becomes smaller and the system was more stable.The mulliken population and migration barrier of the co-doped system was calculated.The calculated results indicate that when the oxygen vacancy de-fects exist,the Ag-O bond was enhanced obviously,the migration barrier of the Ag ions becomes smaller and the electrochemical performance was also enhanced.In addition,the calculated results of the interaction energy among the defects of the co-doped system are negative,which show that the associative ability exists among the defects and the system becomes more stable.
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