Molecular Dynamic Simulation of Interaction of CH and Fusion Material Be
cao xiaogang,tian shuping,ou wei,zhang jingquan,pan yudong,gou fujun,chen shunli
DOI: https://doi.org/10.3969/j.issn.1672-7126.2014.07.05
2014-01-01
Abstract:The interaction of CH and fusion material Be is studied by molecular dynamic method in this paper.According to the environment in the tokamak,the simulated incident energy of the incident particle are low energy( 1,5,10,25 eV) and high energy( 50,100,150,200 eV),respectively,the deposition rate of carbon atoms increased with the incident energy gradually,while it is opposite for the hydrogen atoms.When the incident energy of CH is low,a layer of hydrocarbon film is formed on the surface of Be,and increasingly film becomes more and more thicker as a function of incident energy,meanwhile,the intermediate layer is formed with thickness increase.When incident energy of the incident particle is high,the sputtering of Be atom increase largely,the penetration depth of the incident particle get deeper in the sample,the sample is destructed by the incident particle increasingly,and forming a reaction layer in the sample.