Deposited Carbon Distributions on Nickel Film/oxide Substrate Systems

Masashi Yoshinaga,Haruo Kishimoto,Katsuhiko Yamaji,Yue-Ping Xiong,Manuel E. Brito,Teruhisa Horita,Harumi Yokokawa
DOI: https://doi.org/10.1016/j.ssi.2010.05.003
IF: 3.699
2010-01-01
Solid State Ionics
Abstract:Distribution of deposited carbon at early stage is investigated by micro-Raman spectroscopy. Model samples consisting of nickel films sputtered on oxide substrates were used. Carbon deposition treatment was carried out for three nickel/oxide systems: Ni/YSZ (Yttria Stabilized Zirconia), Ni/ScSZ (Scandia Stabilized Zirconia), and Ni/GDC (Gadolinia doped ceria) at 873K under dry 4.9% CH4/Ar gas. Significant carbon deposition was observed on the nickel surfaces for both Ni/YSZ and Ni/ScSZ. No carbon was observed on the nickel surfaces of Ni/GDC system. According to Raman spectra, the deposited carbon bonding state was similar between Ni/YSZ and Ni/ScSZ systems and it correspond to a graphitic phase.
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