Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

Francis Houlihan,Shinji Miyazaki,Alberto Dioses,Lin Zhang,Yuki Ubayashi,Kazuyoshi Ohta,Joseph Oberlander,Alexandra Krawicz,Sumathy Vasanthan,Meng Li,Yayi Wei,PingHung Lu,Mark Neisser
DOI: https://doi.org/10.2494/photopolymer.21.383
2008-01-01
Journal of Photopolymer Science and Technology
Abstract:We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's.
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