Research Development on LiNbO_3 Dry Etching

Yao Yanqing,Li Jinyang,Wu Jianjie,Chen Fang,Qi Zhimei
DOI: https://doi.org/10.3969/j.issn.1671-4776.2012.03.011
2012-01-01
Abstract:The dry etching technology for lithium niobate(LN) crystal is reviewed.According to the etching mechanism and characteristics,the existing LN dry etching methods can be classified as the plasma etching,laser micromachining technique and Ti diffusion electrochemical etching.The etching methods and research progress are summarized.The difference and relationship of the different etching methods are analyzed,and the problems of the etching methods are discussed.The plasma etching technology is most widely used because of its excellent pattern transfer characteristics.The laser micromachining technique has the unique advantages in the preparation of the photonic crystal structure and micro-grating structure.The Ti diffusion electrochemical etching indicates a new development direction for the fabrication of large scale pattern on LN.
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