Effects of Thickness of the Thermal Insulation Layer on the Properties of PbTiO3 Thin Films

Xiaoqing Wu,Xi Yao,Wei Ren,Peng Shi,Liangying Zhang
DOI: https://doi.org/10.1007/s10832-007-9286-0
2007-01-01
Journal of Electroceramics
Abstract:A multilayer pyroelectric thin film structure (MPTFS) is one of promising candidates for applications on uncooled IR focal plane array detectors. In the MLPTFS, a porous silica film is used as a thermal insulation layer, and the thermal insulation is improved with increasing thickness of a porous silica film. On the other hand, the effects of thickness of the porous silica films on the electrical properties of pyroelectric thin films need to be addressed. The research results have shown: the thickness of the porous silica films can not be increase unboundedly. With increasing thickness of porous silica films, the coercive field increase, the dielectric constant and the breakdown field decrease respectively. When the thickness of the porous silica films is lower than 3 μm, the effects of the porous silica films on the properties of PT thin films are acceptable. The optimized thickness of the porous silica films is determined according to the results of the electrical properties.
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