A humidity-resistant highly sensitive holographic photopolymerizable dry film

Qiaoxia Gong,Sulian Wang,Mingju Huang,Fuxi Gan
DOI: https://doi.org/10.1016/j.matlet.2005.05.008
IF: 3
2005-01-01
Materials Letters
Abstract:A new humidity-resistant highly sensitive acrylamide-based photopolymeric holographic recording material has been developed. The photopolymer is resistant to the humidity of environment. Diffraction efficiencies near 50% are obtained with exposure energy of 60 mJ/cm2 in materials of 150 μm thickness. Diphenyl iodonium chloride is added to the material and can increase the exposure sensitivity by a factor of more than 4 (to about 28 mJ/cm2). An image has been successfully stored in the material with a small distortion.
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