Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process

SZ Zhu,CH Xing,W Xu,GF Jin,ZT Li
DOI: https://doi.org/10.1021/cg0300275
IF: 4.01
2003-01-01
Crystal Growth & Design
Abstract:A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N',N'-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule.
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