Low-temperature deposition of ultrafine rutile TiO2 thin films by the hydrothermal method

Qianwang Chen,Yitai Qian,Zuyao Chen,Yunbo Jia,Guien Zhou,Xiaoguang Li,Yuheng Zhang
DOI: https://doi.org/10.1002/pssa.2211560216
1996-01-01
Abstract:Ultrafine (50 x 20 nm(2)) rutile TiO2 thin films (0.18 mu m) on alpha-Al2O3 substrates have,een prepared by hydrothermal treatment of a solution of a mixture of TiO42- (0.5 M) and HNO3(2.0 M) at low temperatures. Films prepared in the temperature range of 100 to 200 degrees C contain only the rutile phase and adhere well to the substrates. The acidity of the solution and the hydrothermal treatment time are the critical parameters determining the formation of pure rutile phase.
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