The Formation of Ordered Nanoholes in Binary, Chemically Similar, Symmetric Diblock Copolymer Blend Films

Yu Xuan,Juan Peng,Hanfu Wang,Binyao Li,Yanchun Han
DOI: https://doi.org/10.1002/marc.200400060
IF: 5.006
2004-01-01
Macromolecular Rapid Communications
Abstract:Binary symmetric diblock copolymer blends, that is, low-molecular-weight poly(styrene-block-methyl methacrylate) (PS-b-PMMA) and high-molecular-weight poly(styrene-block-methacrylate) (PS-b-PMA), self-assemble on silicon substrates to form structures with highly ordered nanoholes in thin films. As a result of the chemically similar structure of the PMA and the PMMA block, the PMMA chain penetrates through the large PMA block that absorbs preferentially on the polar silicon substrate. This results in the formation of nanoholes in the PS continuous matrix.
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