Microstructure and Tensile Strength of Cu with Nano-Scale Twins

Y. Shen,X. Chen,B. Wu,L. Lu
DOI: https://doi.org/10.1007/978-1-4020-5624-6_3
2007-01-01
Abstract:Tensile test was performed on an electrodeposited pure Cu sample with high density growth-in twins confined in the submicro-sized grains. It is found that the Cu sample has an ultra-high tensile strength (similar to 1.0 GPa) and a good ductility (similar to 13.5%). Microstructure observations indicated that twin boundary provides a strong barrier for the motion of dislocations during plastic deformation.
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