In-situ Synchrotron X-ray Diffraction Study of Stress-Induced Phase Transformation in Ti50.1Ni40.8Cu9.1 Thin Films
H. Wang,G. A. Sun,B. Chen,Y. Q. Fu,X. L. Wang,X. T. Zu,H. H. Shen,Y. P. Liu,L. B. Li,G. Q. Pan,L. S. Sheng,Q. Tian
DOI: https://doi.org/10.1016/j.physb.2012.04.054
IF: 2.988
2012-01-01
Physica B Condensed Matter
Abstract:Stress-induced martensitic transformation of as-sputtered and post-annealed Ti50.1Ni40.8Cu9.1 thin films was investigated using in-situ synchrotron X-ray diffraction (S-XRD) technique. For the as-deposited film, in-situ S-XRD analysis showed a martensitic transformation from parent phase to martensite during initial loading, followed by reorientation of martensite variants via detwinning. This detwinning process induced a strong 〈020〉 fiber texture along the loading direction and a strong 〈002〉 fiber texture perpendicular to the loading direction. For the 650°C annealed film, there is only elastic deformation, followed by a martensitic transformation during deformation.