Fully Automated Cd - Metrology And Mask Inspection In A Mask Production Environment Using The Muetec < M5k > Duv Tool

G Scheuring,A Petrashenko,S Dobereiner,F Hillmann,Hj Bruck,Ac Hourd,A Grimshaw,G Hughes,Sb Chen,P Chen,T Schatz,T Struck,P Van Adrichem,H Boerland,S Lehnigk
DOI: https://doi.org/10.1117/12.515107
2003-01-01
Abstract:Besides the metrology performance of a CD measurement tool, its close integration into a manufacturing environment becomes more and more important. This is extremely driven by the ever increasing complexity of masks and their tightening specifications. Hence, this calls for the capability of fully automated CD measurements on a large number of dense and isolated lines and 2-dimensional features under production conditions.In this paper we report on such a highly automated measurement system for CD measurements from MueTec. Either an ASCII software interface or a specially developed software interface to connect the MueTec <M5k> with the CATS(TM) mask data fracturing software handles the large amount of co-ordinates and other information like design images from the measurement sites and their surrounding, which are necessary for fully automated CD measurements. Because the latter is the standard in mask-making and data-formats, this level of automation guarantees a good industrial integration of the MueTec system.Fully automated and reliable CD measurements are based on very stable tool hardware and especially on a positioning stage with best possible positioning accuracy (range better 0.5 mum), significantly improved possibilities of software controlled positioning and an automated job set up and execution.The time gain in relation to existing measurement programs in the extent of supply has turned out to be dramatically large. The User Interfaces and their applications will be described.
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