Influence of annealing on microstructure and defect-related photoluminescence of Ni0.7Zn0.3O thin film

Fangting Lin,Na Li,Xueming Ma,Wangzhou Shi
2007-01-01
Abstract:Ni0.7Zn0.3O thin film was prepared on Si(100) substrate at 500°C by pulsed-laser deposition. Annealing was performed at 1000°C for 60 min to change the state of defects in the sample. X-ray diffractometer, scanning electron microscope, fluorescence spectrometer were used to analyze microstructure, morphology and defect-related photoluminescence. The results show that the as-deposited film is of cubic Ni0.7Zn0.3O single phase with preferred (200) growth orientation and there are the coexistence of ZnO and Ni0.7Zn0.3O in, the annealed sample. Ni0.7Zn0.3O film exhibits abundant room-temperature fluorescence spectra originating from transitions among defect energy levels of Ni0.7Zn0.3O. Annealing induces variations in the type and concentration of defects, which greatly influence the defect-related photoluminescence.
What problem does this paper attempt to address?