Atomic Structural Model of the Si/SiO_2 Interface

Du Longhuan,Rong Limei,Du Jiangfeng,Yu Qingwei,Zheng Xiaoming
2013-01-01
Abstract:Theoretical calculation has gradually become an indispensable way to study the Si/SiO2 interface characteristics at the atomic scale.Choosing an appropriate Si/SiO2 interface atomic structure model is the precondition to accurately calculate the Si/SiO2 interface characteristics.The main results of the experimental study and theoretical calculation of the Si/SiO2 interface characteristics were sorted and compared,and the atomic structure models and their characteristics of the Si/SiO2 interface were introduced.The advantages and disadvantages of these models and their applicabilities were analyzed in terms of the crystal orientation of Si substrate,the composition and thickness of the transition layer and the electronic properties.As a result,it is considered that the model with the silicon suboxide as the transition layer can better explain the experimental data,and it is suitable for the simulation of the interface structural and electronic properties.This study has important significance to improve the Si/SiO2 atomic structure model,study the interface defects and analyze the effects of interface defects on device performances at the atomic scale.
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