Abstract:MgB2 has been recognized as a candidate material for fabricating superconducting nanowire single photon detectors with the expectation of having an operating temperature of the detector at 10-20 K. Preparation of ultrathin MgB2 films with high superconducting transition temperature TC is the first crucial step to achieve this goal. Here we present the hybrid physical-chemical vapor deposition of MgB2 superconducting films with thicknesses around 10 nm. The films are epitaxially grown on (111) MgO substrates. The TC of the films, including for a 6-nm-thick film, is found to be above 34 K, close to the bulk value of MgB2 (39 K). The normal-state resistivity at 42 K of a 10-nm-thick film is shown to be 3.1 μΩ cm, indicating that the film is relatively clean. The superconducting critical current density JC of the films has also been measured on strip lines patterned in the films. The JC of the 10-nm-thick film reaches 7.7 ×107 A/cm2 at 2 K, so far the highest value reported for MgB2 films of the same thickness. The high TC, low residual resistivity, and high JC of the ultrathin MgB2 films on MgO substrates suggest that these films have the potential in developing MgB2-based superconducting nanowire single photon detectors or other related superconducting devices.

Superconducting MgB2 Thin Films with Tc ≈ 39 K Grown by Pulsed Laser Deposition

MgB2 superconducting thin films with a transition temperature of 39 Kelvin

Superconducting MgB2 thin films by pulsed laser deposition

Properties of Chemical-Vapor-deposition-prepared MgB2 Thin Films

Growth and Superconductivity Characteristics of Mgb2 Thin Films

Superconducting magnesium diboride films on Silicon with Tc0 about 24K grown via vacuum annealing from stoichiometric precursors

MgB2 thick film with TC = 40.2 K deposited on sapphire substrate

MgB2 superconductor thin films on Si and Al2O3 substrates

In-situ Magnesium Diboride Superconducting Thin Films grown by Pulsed Laser Deposition

GROWTH AND PROPERTIES OF SUPERCONDUCTING MgB_2 THIN FILM FABRICATED ON Al_2O_3 SUBSTRATE BY HYBRID PHYSICAL CHEMICAL VAPOR DEPOSITION

MgB 2 Thick Films Deposited on Stainless Steel Substrate with T C Higher Than 39 K

MgB2 Superconducting Films Fabricated on Copper Substrate by Hybrid Physical-Chemical Vapor Deposition

Ultrathin MgB2films Fabricated on Al2O3substrate by Hybrid Physical–chemical Vapor Deposition with Hightcandjc

Growth of MgB2 Thin Film Fabricated on Mg Substrate by Hybrid Physical-Chemical Vapor Deposition

MgB<sub>2</sub> thick films deposited on stainless steel substrate with <i>T</i> <sub>c</sub> higher than 39 K

Hybrid Physical-Chemical Vapor Deposition of Ultrathin Mgb2 Films on Mgo Substrate with High T-C and J(C)

Fabrication of superconducting magnesium diboride thin films by electron beam annealing

Progress in Depositing MgB2 Films on Stainless Steel Substrate

Effect of Thickness on Properties of MgB2 Thin Films

A Study on the Components of MgB2 Thick Film Prepared Via HPCVD