Selective Tungsten Deposition into Ordered Nanohole Arrays of Anodic Porous Alumina by Electron-Beam-induced Deposition

G.Q. Xie,M. Song,K. Mitsuishi,K. Furuya
DOI: https://doi.org/10.1007/s00339-004-2926-1
2004-01-01
Abstract:The selective deposition of a metal (tungsten) into ordered nanohole arrays of an anodic porous alumina membrane was performed using an electron-beam-induced deposition process. After deposition, the membrane was observed and analyzed using electron microscopy and energy-dispersive X-ray spectroscopy. It is shown that the deposition was preferentially conducted in the holes in the irradiated area of the electron beam. A calculation of the electron-beam intensity explains the reason for the preferential deposition in the holes.
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