The relation between rough and flat growth of crystal faces: an effective approach to volume transport resistances

Xiang-Yang Liu,G. Arkenbout,P. Bennema,P. van Hoof
DOI: https://doi.org/10.1016/0022-0248(93)90171-R
IF: 1.8
1993-01-01
Journal of Crystal Growth
Abstract:In this paper, a simple approach has been presented to describe and estimate the resistance against volume transport during crystal growth. Following from a simple model, it is obtained that using the relation between the kinetics of rough growth and that of flat growth, the resistances against volume diffusion can be estimated. Within the framework of this approach, a so-called auxiliary straight line method is developed to extract the fractions of the total driving force remaining at the surface from available experimental results. As applications and experimental verifications, the kinetic data of different n-paraffin and naphthalene crystal-solution systems are analyzed by the aforementioned method. For the n-paraffin systems, the data obtained from kinetic roughening experiments are compared with those obtained from thermal roughening experiments. The results turn out to be in excellent agreement with eaxh other.
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