Enhanced Photocatalytic Activity of Tio2 Thin Film Coating on Microstructured Silicon Substrate

Liwei Yang,Yulan Wang,Li Zhao
DOI: https://doi.org/10.3788/col201210.063102
IF: 2.56
2012-01-01
Chinese Optics Letters
Abstract:Photocatalytic TiO2 thin film is prepared by sol gel technique on microstructured silicon substrate produced by femtosecond laser cumulative irradiation. The photocatalytic activity is evaluated by the degradation of methylene blue (MB) solution under ultraviolet (UV) irradiation. For 6-ml MB solution with initial concentration of 3.0 x10(-5) mol/L, the degradation rate caused by TiO2 thin film of 2-cm(2) area is higher than 70% after 10-h UV irradiation. Microstructured silicon substrate is found to enhance photocatalytic activity of the TiO2 thin film remarkably. The femtosecond laser microstructured silicon substrate is suitable to support TiO2 thin film photocatalysts.
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