MgNiO-based Metal–semiconductor– Metal Ultraviolet Photodetector

Yanmin Zhao,Jiying Zhang,Dayong Jiang,Chongxin Shan,Zhenzhong Zhang,Bin Yao,Dongxu Zhao,Dezhen Shen
DOI: https://doi.org/10.1088/0022-3727/42/9/092007
2009-01-01
Journal of Physics D Applied Physics
Abstract:In this study, we report the growth of MgxNi1−xO thin films on quartz substrates by electron beam evaporation. The absorption edge shows a blue shift from 340 nm to 260 nm with increase in the Mg content from 0.2 to 0.8. A metal–semiconductor–metal structured photodetector is fabricated from the Mg0.2Ni0.8O film. At a bias of 5 V, the dark current of the photodetector is about 70 nA. The maximum responsivity is about 147.3 µA W−1 at 320 nm. In addition, the ultraviolet (UV) (320 nm) to visible (400 nm) rejection ratio is nearly two orders of magnitude. Based on these results, it is proposed that MgxNi1−xO is a potential candidate for application in UV photodetectors.
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