Abstract:This work demonstrated the combination of the self-assembly of a block copolymer with the well-established non-solvent induced phase separation process. Nanoporous films were obtained with well-ordered cylinder pores perpendicular to the film surfaces on top of a non-ordered bicontinous porous layer. Numerous parameters during the film formation process, including the concentration of casting solution, the solvent evaporation time, the temperature of precipitation bath, and the gate height of doctor blade, were systematically investigated to realize the effective control of surface morphology. Voronoi tessellation was first introduced to quantitatively describe the regularity of the surface pattern. It was found that the concentration of casting solution and the solvent evaporation time have synergetic influences on the porous structures. With the increase of concentration, the minimum evaporation time needed for a well-ordered porous surface decreases. If keep the concentration as a constant, the evolution of surface morphologies from non-ordered cylinder pores to ordered cylinder pores, and then to lamellar pores, was observed with the increase of evaporation time. Although lots of combinations of these two parameters can be utilized for the well-ordered structure formation, the mean pore size of the film surface didn't change significantly with the change of film preparation conditions. Besides, the decrease of the temperature of precipitation bath also helped to improve surface pattern regularity. Further study revealed that once the gate height of casting solution was decreased, the evaporation of solvent induced more significant change of casting solution concentration and the solvent composition, resulting in the disappearance of well-ordered cylinder pores. Two ways, including decreasing the solvent evaporation time and applying the solvent annealing process, were proven to be very effective to prepare thinner films with well-ordered nanoporous structures. The above results greatly broaden the operation window and provide possibilities to fabricate films suitable for different applications.

The Growth Mechanism of Continuous Cubic Mesoporous Sba-16 Film with A Large Area of Highly Ordered Pores

Defects and domain structures in SBA-16 mesoporous films with 3D cubic structure

Continuous Mesoporous Silica Films with Highly Ordered Large Pore Structures

Controlling Pore Size and Wettability of A Unique Microheterogeneous Copolymer Film with Porous Structure

Formation of Continuous Cubic Mesoporous Films by Spin Casting

Synthesis and Characterization of Small Pore Thick-Walled SBA-16 Templated by Oligomeric Surfactant with Ultra-Long Hydrophilic Chains

Fabrication of Adsorption-Type Hierarchical Functional Films by Using a Facile Swollen Based Breath Figure Method.

Quantitative Analysis of Defects and Domain Boundaries in Mesoporous SBA-16 Films

Direct Imaging of the Layer-by-layer Growth and Rod-Unit Repairing Defects of Mesoporous Silica SBA-15 by Cryo-Sem

Growth of mesoporous materials within colloidal crystal films by spin-coating

Preparation and Morphology Control of Highly Ordered Nanoporous Films from Block Copolymers

Stabilizing Surfactant Templated Cylindrical Mesopores In Polymer And Carbon Films Through Composite Formation With Silica Reinforcement

Highly Ordered Mesoporous Silica Films with Perpendicular Mesochannels by a Simple Stöber‐Solution Growth Approach

Pore size design of ordered mesoporous silicas by controlling micellar properties of triblock copolymer EO20PO70EO20

Nonionic Block Copolymer and Anionic Mixed Surfactants Directed Synthesis of Highly Ordered Mesoporous Silica with Bicontinuous Cubic Structure

Challenges in fabrication of mesoporous carbon films with ordered cylindrical pores via phenolic oligomer self-assembly with triblock copolymers.

Three-Dimensional Cubic Mesoporous Structures of SBA-12 and Related Materials by Electron Crystallography

Mechanism of forming an ink-bottle-like pore structure based on SBA-15 by a novel MOCVD technique

Growing high-quality C60 films by using Sb buffer layer

Effect of Different Structured POSS/GMA-containing Copolymers on the Morphology of Porous Coating by Breath-Figures Method

Highly Oriented and Ordered Microstructures in Block Copolymer Films