Recent progress of the 3rd generation infrared FPAs

HE Li,Xiaoning Hu,DING Rui-jun,Yanjin Li,Jianrong Yang,Qinyao Zhang
DOI: https://doi.org/10.3969/j.issn.1007-2276.2007.05.029
2007-01-01
Infrared and Laser Engineering
Abstract:Research results on molecular-beam epitaxial growth of HgCdTe and FPA fabrications with mesa architecture focusing on the requirements by the 3rd generation of infrared focal plane arrays are described,and the growth of HgCdTe on GaAs and Si wafers,p-type doping as well as mesa fabrication are expatiated.A good composition uniformity was observed over 3-in HgCdTe wafers.And the twins induced by the large lattice mismatch could be depressed by a proper procedure of low temperature nucleation.A typical value of FWHM of(422) X-ray diffraction was found to be 55″-75″ for epilayers grown on GaAs and Si.The ICP dry etching technique for HgCdTe is studied,and some good results on surface morphology,damage,as well as anisotropic mesa shaping were obtained.The multilayered structures HgCdTe were developed into LW n-on-p,p-on-n as well as SW/MW dual color FPA fabrications,the preliminary results are reported.
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