Expression of Recombinant Colorectal Cancer Antigen Ga733-2 in Plants and Its Immune Response in Mice

Kyung-Il Kim,Ki-Hyun Yoo,Ha-Young Chung,Ji-Hye Lee,Hyun-Ho Lee,Yeon-Joo Seok,Jeon Hwang-Bo,En-Ji Cui,Ki-Sung Ko,Inhwan Hwang,Young-Hee Joung,Hyung-Sik Kang,Doo-Byoung Oh,In-Sik Chung
DOI: https://doi.org/10.1016/j.jbiosc.2009.08.051
IF: 3.185
2009-01-01
Journal of Bioscience and Bioengineering
Abstract:The low-temperature plasma-enhanced chemical vapor deposition of SiNx has been studied. The main process parameters are: temperature, i.e., between 100°C and 250°C, and power, i.e., between 300 and 700 W. Variation of the film's deposition rate and bond structure with respect to these process parameters were investigated. The influence of the plasma power to film's characteristics at the low substrate temperature is more pronounced than that at the high substrate temperature. The influence of the plasma condition to the reaction mechanism is discussed.
What problem does this paper attempt to address?