Effects Of Electrodeposition Conditions On The Microstructures Of Zno Thin Films

Songtao Jiang,Mengqiang Wu,Ying Zhou,Yuan Wen,Chengtao Yang,Shuren Zhang

DOI: https://doi.org/10.1080/10584580601098563

2007-01-01

Integrated Ferroelectrics

Abstract:ZnO thin films were grown by cathodic deposition on indium tin oxide (ITO)-covered glass substrates from a simple aqueous zinc nitrate solution. Cyclic voltammetry (CV) experiments were performed to verify the reaction mechanism. X-ray diffraction measurements indicated that the as-grown films were of hexagonal wurtzite structure. ne influence of the electrodeposition conditions and the post-heating on the microstructures of the polycrystalline ZnO thin films was investigated by SEM and AFM observations. The microstructures of the ZnO thin films could be improved by annealing treatment. The films obtained at 0. 1 M Zn(NO3), -0.9 V potential and 65 degrees C were compact, homogeneous and (002) oriented, and the average deposition rate can be evaluated to be 2 mu m/h.