Top-down patterning of topological surface and edge states using a focused ion beam

Abdulhakim Bake,Qi Zhang,Cong Son Ho,Grace L. Causer,Weiyao Zhao,Zengji Yue,Alexander Nguyen,Golrokh Akhgar,Julie Karel,David Mitchell,Zeljko Pastuovic,Roger Lewis,Jared H. Cole,Mitchell Nancarrow,Nagarajan Valanoor,Xiaolin Wang,David Cortie
DOI: https://doi.org/10.1038/s41467-023-37102-x
IF: 16.6
2023-03-27
Nature Communications
Abstract:Abstract The conducting boundary states of topological insulators appear at an interface where the characteristic invariant Z 2 switches from 1 to 0. These states offer prospects for quantum electronics; however, a method is needed to spatially-control Z 2 to pattern conducting channels. It is shown that modifying Sb 2 Te 3 single-crystal surfaces with an ion beam switches the topological insulator into an amorphous state exhibiting negligible bulk and surface conductivity. This is attributed to a transition from Z 2 = 1 → Z 2 = 0 at a threshold disorder strength. This observation is supported by density functional theory and model Hamiltonian calculations. Here we show that this ion-beam treatment allows for inverse lithography to pattern arrays of topological surfaces, edges and corners which are the building blocks of topological electronics.
multidisciplinary sciences
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