Topological van der Waals Contact for Two-Dimensional Semiconductors

Soheil Ghods,Hyunjin Lee,Jun-Hui Choi,Ji-Yun Moon,Sein Kim,Seung-Il Kim,Hyung Jun Kwun,Mukkath Joseph Josline,Chan Young Kim,Sang Hwa Hyun,Sang Won Kim,Seok-Kyun Son,Taehun Lee,Yoon Kyeung Lee,Keun Heo,Kostya. S. Novoselov,Jae-Hyun Lee
DOI: https://doi.org/10.1021/acsnano.4c07585
IF: 17.1
2024-09-13
ACS Nano
Abstract:The relentless miniaturization inherent in complementary metal-oxide semiconductor technology has created challenges at the interface of two-dimensional (2D) materials and metal electrodes. These challenges, predominantly stemming from metal-induced gap states (MIGS) and Schottky barrier heights (SBHs), critically impede device performance. This work introduces an innovative implementation of damage-free Sb(2)Te(3) topological van der Waals (T-vdW) contacts, representing an ultimate contact...
materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology
What problem does this paper attempt to address?