Ion beam measurement systems and methods for ion implant dose and uniformity control

클라우스 페트리,조셉 퍼라라,벡커 클라우스
2005-08-08
Abstract:The dose measuring system for measuring the ion beam scanning at a plurality of points along the curve in the work position in the processing chamber and a method is also provided. In the illustrated dosimetry system comprises a sensor and the installation unit, said installation unit is to support the sensors, and optionally arranged in the sensor in a plurality of points along the curve, the installation apparatus of the ion beam of the scanning the sensor can be selectively disposed in a face to the apex. Processing chamber, the workpiece, curved path, the dosimetry system, sensor
Medicine,Engineering,Materials Science
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