Preparation of V2O5-Ink for the Fabrication of V2O5 Thin Films by the Spin Coating Method

Syeda Samiha Nushin,Md Islahur Rahman Ebon,Md Shamiull Alim Munna,Md Ahasanur Rabbi,Md Mahbubor Rahman,Jaker Hossain
DOI: https://doi.org/10.1021/acs.inorgchem.4c02892
2024-10-21
Abstract:This article reports the preparation of V2O5 ink via a novel chemical route. The prepared V2O5 ink has been spin coated for the synthesis of V2O5 thin films on glass substrates. The synthesized V2O5 thin films were annealed at 300-400 °C in air and characterized by different techniques. The X-ray diffraction data reveal the phase pure V2O5 compound with polycrystalline nature. The scanning electron microscopy micrographs unravel that the V2O5 thin films are smooth with few nanoflakes presented on the surfaces. An optical study reveals that transmittance and bandgap of the V2O5 thin films decrease with annealing temperature. The bandgap of the films varies in the range of 2.8-2.9 eV. These findings have opened a new avenue for the preparation of metal oxide ink. The prepared V2O5 ink is promising for the manufacture of low-cost V2O5-based photoelectrochemical cells.
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