Interplay between Point and Extended Defects and Their Effects on Jerky Domain-Wall Motion in Ferroelectric Thin Films

Ralph Bulanadi,Kumara Cordero-Edwards,Philippe Tückmantel,Sahar Saremi,Giacomo Morpurgo,Qi Zhang,Lane W Martin,Valanoor Nagarajan,Patrycja Paruch
DOI: https://doi.org/10.1103/PhysRevLett.133.106801
2024-09-06
Abstract:Defects have a significant influence on the polarization and electromechanical properties of ferroelectric materials. Statistically, they can be seen as random pinning centers acting on an elastic manifold, slowing domain-wall propagation and raising the energy required to switch polarization. Here we show that the "dressing" of defects can lead to unprecedented control of domain-wall dynamics. We engineer defects of two different dimensionalities in ferroelectric oxide thin films-point defects externally induced via He^{2+} bombardment, and extended quasi-one-dimensional a domains formed in response to internal strains. The a domains act as extended strong pinning sites (as expected) imposing highly localized directional constraints. Surprisingly, the induced point defects in the He^{2+} bombarded samples orient and align to impose further directional pinning, screening the effect of a domains. This defect interplay produces more uniform and predictable domain-wall dynamics. Such engineered interactions between defects are crucial for advancements in ferroelectric devices.
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