Low-temperature open-atmosphere growth of WO3 thin films with tunable and high-performance photoresponse
Zhuotong Sun,Subhajit Bhattacharjee,Ming Xiao,Weiwei Li,Megan O. Hill,Robert A. Jagt,Louis-Vincent Delumeau,Kevin Philip Musselman,Erwin Reisner,Judith MacManus-Driscoll,Megan O Hill,Kevin P. Musselman
DOI: https://doi.org/10.1039/d3tc02257a
IF: 6.4
2024-03-14
Journal of Materials Chemistry C
Abstract:Tungsten oxide (WO 3 ), an n-type semiconductor, has many potential applications, e.g. , electrochromic devices, photodetectors, photoelectrochemical cells, photocatalysts, supercapacitors, memristors, electrolyte-gated transistors, etc. Most deposition routes of films require either vacuum processes or post-deposition annealing, which is not suitable for many applications. In this work, WO 3 thin films are made from a W[CO] 6 precursor using atmospheric pressure-spatial chemical vapor deposition (AP-SCVD), without any post-deposition annealing. Films were grown on Si substrates at 320 °C and were conformal over cm 2 areas, with the film-preferred orientations tuned via control of growth rate. Three exemplar photo-responsive functions with strong performance are demonstrated: water oxidation, UV photodetection, and photocatalytic degradation. The strong performance is linked to the highly exothermic reaction which produces crystalline materials at a low deposition temperature as well as control of the film orientation through tuning the film growth rate. Overall, AP-SCVD is shown to have key advantages over other routes for forming WO 3 thin films for photo-responsive applications.
materials science, multidisciplinary,physics, applied