Electrical properties of hafnium silicate films obtained from a single-source MOCVD precursor

M. Lemberger,A. Paskaleva,S. Zürcher,A. Bauer,L. Frey,H. Ryssel
DOI: https://doi.org/10.1016/j.microrel.2004.11.040
2005-05-01
Abstract:
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