Photolithography-assisted precise patterning of nanocracks for ultrasensitive strain sensors

Junshan Liu,Hongji Guo,Ming Li,Chi Zhang,Yongzhi Chu,Lixuan Che,Zhihao Zhang,Rui Li,Jining Sun,Yao Lu
DOI: https://doi.org/10.1039/d0ta11374c
IF: 11.9
2021-01-01
Journal of Materials Chemistry A
Abstract:A photolithography-assisted nanocrack patterning method is reported to precisely define the nanocrack pattern in metal films. This method is used to fabricate an ultrasensitive strain sensor with a gauge factor of ∼20 000 in 0–1.2% strain range.
materials science, multidisciplinary,chemistry, physical,energy & fuels
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