Controlled high-quality interface of a Ti2.5O3(0 1 0)/GaAs(0 0 1) heterostructure enabled by minimized lattice mismatch and suppressed ion diffusion

Yunxia Zhou,Xingpeng Liu,Jun Zhu
DOI: https://doi.org/10.1016/j.jcis.2019.10.041
2020-02-15
Abstract:Metal oxide/semiconductor heterostructures exhibit great potential for high-performance electronic device applications, but the interfacial defects resulting from lattice mismatch pose significant challenges to improving the performance of these devices. In this study, we reported a construction of a single crystal Ti2.5O3/GaAs heterostructure with minimum lattice mismatch between titanium sub-oxides and GaAs substrate. Low lattice mismatch values of 0.3% or 0.6% can be achieved along different orientations. Further experimental analyses demonstrate that high crystalline Ti2.5O3 (0 1 0) film can be grown layer by layer on GaAs (0 0 1) substrate with highly compatible interface. The defect-free interface significantly suppresses the diffusion of As and Ga ions, which impedes the formation of arsenic oxide and gallium oxide at the interface. Due to the high-quality Ti2.5O3 layer, the integrated BaTiO3(250 nm)/SrTiO3/Ti2.5O3(5 nm)/GaAs heterostructure exhibits an enhanced hysteresis loop with a remnant polarization of 9.85 µC/cm2 at 600 kV/cm and a small leakage current density of 1 × 10-5 A/cm2 at -500 kV/cm. The considerable advantage of this Ti2.5O3/GaAs heterostructure provides an example of integrating other functional oxides for GaAs with suppressed ion diffusion. It also provides a platform for fabricating different electronic devices with higher reliability and performance.
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