Abstract:Lithography techniques are currently being developed to fabricate nanoscale components for integrated circuits, medical diagnostics and optoelectronics 1 , 2 , 3 , 4 , 5 , 6 , 7 . In conventional far-field optical lithography, lateral feature resolution is diffraction-limited 8 . Approaches that overcome the diffraction limit have been developed 9 , 10 , 11 , 12 , 13 , 14 , but these are difficult to implement or they preclude arbitrary pattern formation. Techniques based on near-field scanning optical microscopy can overcome the diffraction limit, but they suffer from inherently low throughput and restricted scan areas 15 , 16 , 17 . Highly parallel two-dimensional, silicon-based, near-field scanning optical microscopy aperture arrays have been fabricated 18 , but aligning a non-deformable aperture array to a large-area substrate with near-field proximity remains challenging. However, recent advances in lithographies based on scanning probe microscopy have made use of transparent two-dimensional arrays of pyramid-shaped elastomeric tips (or ‘pens’) for large-area, high-throughput patterning of ink molecules 19 , 20 , 21 , 22 , 23 . Here, we report a massively parallel scanning probe microscopy-based approach that can generate arbitrary patterns by passing 400-nm light through nanoscopic apertures at each tip in the array. The technique, termed beam pen lithography, can toggle between near- and far-field distances, allowing both sub-diffraction limit (100 nm) and larger features to be generated.

Nanolithography using counter-propagating light-sheets

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

High Throughput Laser Nano Direct Writing Technique

Photolithography Using Lateral Surface of Nanofibers

Light and Matter Co-Confined Multi-Photon Lithography

Optical Vortex Beam Direct-Writing Photolithography

Interfering Coherent Lightsheets Assisted Structure Synthesis (iCLASS) Technique for Nanofabrication

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Parallel Optical Nanolithography Using Nanoscale Bowtie Aperture Array.

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Design and Simulation of Symmetric Nanostructures Using Two-Beam Modulated Interference Lithography Technique

Photon Nanojet Lens: Design, Fabrication and Characterization

Beam Pen Lithography.

Parallel two-photon lithography achieving uniform sub-200 nm features with thousands of individually controlled foci

Hyper-lithography

Nanoscale lithography with visible light: optical nonlinear saturable absorption effect induced nanobump pattern structures

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding