Calcium Fluoride Films with 2–10 nm Thickness on Silicon-(111): Growth, Diagnostics, Study of the through Current Transport

A. G. Banshchikov,M. I. Vexler,I. A. Ivanov,Yu. Yu. Illarionov,N. S. Sokolov,S. M. Suturin
DOI: https://doi.org/10.1134/s1063782623070047
IF: 0.66
2024-03-14
Semiconductors
Abstract:Epitaxial calcium fluoride (CaF 2 ) layers with a nominal thickness up to 10 nm on the (111)-oriented Silicon (Si) are obtained. Surface topographies of the fluoride films are recorded and the current-voltage characteristics of the Au/CaF 2 /Si structures are studied. On a qualitative level, these structures exhibited all the features usual for metal-insulator-semiconductor systems. The current-voltage curves of the samples were reproduced by modeling considering a finite (0.1–1 nm) value of the standard thickness deviation of the dielectric CaF 2 film.
physics, condensed matter
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