Role of intrinsic defects on thermoelectric properties of ZnO:Al films

Shiying Liu,Guojian Li,Mingdi Lan,Miaoyong Zhu,Koji Miyazaki,Qiang Wang
DOI: https://doi.org/10.1016/j.ceramint.2021.03.098
IF: 5.532
2021-06-01
Ceramics International
Abstract:<p>In this study, we explored the role of the intrinsic defects on the tuning thermoelectric (TE) performance of Al-doped ZnO (ZnO:Al) films. The intrinsic defects of the Zn interstitial (Zn<sub>i</sub>) and the oxygen vacancy (V<sub>O</sub>) were controlled by varying the Zn content by using the radio frequency atomic source vacuum evaporation method. In the Zn-rich case, the excessive Zn formed Zn<sub>i</sub> to provide most of the carriers. V<sub>O</sub> became the main origin of the carriers with a decreasing Zn content. When the Zn content was 55.2% and 52.5%, the segregation of Zn<sub>i</sub> decreased the carrier concentration and subsequently, enhanced the resistivity and the Seebeck coefficient. The ZnO:Al film with a Zn content of 52.5% had the highest power factor of 274.03 μW·m<sup>−1</sup>·K<sup>−2</sup> at 819 K. In addition, the higher Zn<sub>i</sub> concentration had a more prominent effect on thermal conductivity. The thermal conductivity increased to 1.756 W·m<sup>−1</sup>·K<sup>−1</sup> from 0.608 W·m<sup>−1</sup>·K<sup>−1</sup> with the Zn content decreasing from 55.2% to 50.6%. The ZT value reached the highest of 0.121 when the film had the optimum Zn concentration of 51.5%. This study concluded that the tuning of the intrinsic defects was an effective method to enhance the TE performance.</p>
materials science, ceramics
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