Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer

Hyeong Min Jin,Seung Hyun Lee,Ju Young Kim,Seung-Woo Son,Bong Hoon Kim,Hwan Keon Lee,Jeong Ho Mun,Seung Keun Cha,Jun Soo Kim,Paul F Nealey,Keon Jae Lee,Sang Ouk Kim
DOI: https://doi.org/10.1021/acsnano.5b07511
IF: 17.1
2016-03-22
ACS Nano
Abstract:Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization of silicon or oxides for display applications. Two-dimensional materials such as graphene exhibit remarkable physical properties and are under intensive development for the manufacture of flexible devices. Here we demonstrate an area-selective ultrafast nanofabrication method using low intensity infrared or visible laser irradiation to direct the self-assembly of block copolymer films into highly ordered manufacturing-relevant architectures at the scale below 12 nm. The fundamental principles underlying this light-induced nanofabrication mechanism include the self-assembly of block copolymers to proceed across the disorder-order transition under large thermal gradients, and the use of chemically modified graphene films as a flexible and conformal light-absorbing layers for transparent, nonplanar, and mechanically flexible surfaces.
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