Hybrid lithography: combining UV-exposure and two photon direct laser writing

Carsten Eschenbaum,Daniel Großmann,Katja Dopf,Siegfried Kettlitz,Tobias Bocksrocker,Sebastian Valouch,Uli Lemmer
DOI: https://doi.org/10.1364/OE.21.029921
2013-12-02
Abstract:We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated.
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