HiPIMS induced high-purity Ti3AlC2 MAX phase coating at low-temperature of 700 °C

Zhongchang Li,Guangxue Zhou,Zhenyu Wang,Jianghuai Yuan,Peiling Ke,Aiying Wang
DOI: https://doi.org/10.1016/j.jeurceramsoc.2023.03.059
IF: 5.7
2023-03-01
Journal of the European Ceramic Society
Abstract:Ti3AlC2, one of Ti-Al-C MAX phases, has received extensive attention due to its unique nano-laminated structure and combined properties of metals and ceramics. However, ultra-high synthesis temperature exceeding 800 °C is a critical challenge for broad application of Ti3AlC2 coatings on temperature-sensitive substrates. In this study, Ti-Al-C coatings were deposited on Ti-6Al-4V substrates using high-power impulse magnetron sputtering (HiPIMS) and DC sputtering (DCMS) for comparison. Different from as-deposited amorphous Ti-Al-C coating by DCMS, nanocrystalline TiAl x compound was achieved by HiPIMS deposition due to highly ionized plasma flux with high kinetic energy. Furthermore, HiPIMS promoted the generation of dense and smooth Ti3AlC2 phase coating after low-temperature annealing at 700 °C, while annealed DCMS coating only obtained Ti2AlC. In-situ XRD demonstrated such Ti3AlC2 phase could be early involved in crystallization at 450 °C, lowest than synthesis temperature ever reported. The mechanical properties of Ti3AlC2 coating were also discussed in terms of structural evolution.
materials science, ceramics
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