Abstract:Characterizing materials using electron micrographs is crucial in areas such as semiconductors and quantum materials. Traditional classification methods falter due to the intricatestructures of these micrographs. This study introduces an innovative architecture that leverages the generative capabilities of zero-shot prompting in Large Language Models (LLMs) such as GPT-4(language only), the predictive ability of few-shot (in-context) learning in Large Multimodal Models (LMMs) such as GPT-4(V)ision, and fuses knowledge across image based and linguistic insights for accurate nanomaterial category prediction. This comprehensive approach aims to provide a robust solution for the automated nanomaterial identification task in semiconductor manufacturing, blending performance, efficiency, and interpretability. Our method surpasses conventional approaches, offering precise nanomaterial identification and facilitating high-throughput screening.

What problem does this paper attempt to address?

### What problems does this paper attempt to solve? This paper aims to solve the problems of automated classification and identification of semiconductor electron micrographs. Specifically, the main challenges of the research include: 1. **High intra - class dissimilarity**: - The same type of nanomaterials shows significant appearance differences in different samples, which makes classification based on traditional methods difficult. 2. **High inter - class similarity**: - Different types of nanomaterials may look very similar or be difficult to distinguish, increasing the complexity of classification. 3. **Multi - spatial scale patterns**: - Nanomaterials present complex visual patterns at different scales, which place higher requirements on classification algorithms. 4. **Limitations of existing models**: - Although large language models (LLMs) such as GPT - 4 and large multimodal models (LMMs) such as GPT - 4V perform well on certain tasks, they have limitations when processing electron micrographs, especially performing poorly in the nanomaterial classification task. To solve the above problems, this research proposes an innovative architecture that combines the following techniques: - **Vision Transformers (ViT)**: Used to extract global representations from electron micrographs. - **Zero - shot prompting**: Utilize large language models (LLMs) to generate detailed nanomaterial descriptions. - **Few - shot prompting**: Guide large multimodal models (LMMs) to perform nanomaterial classification through a small number of examples. - **Cross - modal alignment**: Align image embeddings with text embeddings through the multi - head self - attention mechanism (MHA) to achieve more accurate classification. The ultimate goal is to develop a robust, efficient, and interpretable framework to improve the accuracy of automated nanomaterial identification, thereby supporting high - quality control and high - throughput screening in the semiconductor manufacturing process. ### Formula summary 1. **Loss function**: \[ \min_{\gamma} L_I(I_i, \gamma)=\sum_{(I_i, y_i)\in D_L}\ell(g_\gamma(I_i), y_i) \] where \( g_\gamma(I_i) \) represents the prediction of the multimodal encoder, and \( \ell(\cdot,\cdot) \) is the cross - entropy loss function. 2. **Text embedding calculation**: \[ h_{\text{expl}}=\text{LM}_{\text{expl}}(S_{\text{expl}}) \] \[ h_{\text{text}}=\sum_{j = 0}^{m}\alpha_i h(j)_{\text{expl}} \] where \( \alpha=\text{softmax}(q) \), \( q = u^T h_{\text{expl}} \). 3. **Multi - head self - attention mechanism**: \[ A^h_w=\text{softmax}\left(\frac{Q^h_{\text{cls}}(K^h_{\text{text}})^T}{\sqrt{d_k}}\right) \] \[ O^h_{\text{text}}=A^h_w V^h_{\text{text}} \] 4. **Cosine similarity calculation**: \[ \text{Sim}=\frac{O_{\text{text}}\cdot h

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